Stable Device Isolation Processing for 6-Inch GaN-Based Power Devices
GaN device isolation etching using ICP-RIE and endpoint detection enables uniform processing and stable multi-wafer semiconductor production.
GaN device isolation etching using ICP-RIE and endpoint detection enables uniform processing and stable multi-wafer semiconductor production.
The Technical University of Denmark selects Samco’s RIE-400iP plasma etching system for quantum photonics research, enabling precise III-V processing for single-photon device development.
Professor Kazunori Kataoka presents nanomachine-based drug delivery and the vision of “in-body hospitals” at the 2025 Samco Foundation lecture.
Samco expands partnership with ITRI Taiwan, focusing on semiconductor processing, silicon photonics, and chiplet integration through joint R&D efforts.